{"@context":["https:\/\/schema.org",{"geo":"https:\/\/geo.schema.local\/"}],"@type":"Product","@id":"https:\/\/www.aoqunbrushes.com\/product\/pva-brush#geo","url":"https:\/\/www.aoqunbrushes.com\/product\/pva-brush","name":"Post-CMP PVA brush rollers PVA Sponge for Semiconductor Wafer Cleaning","sku":"","datePublished":"2025-12-12T17:11:30+08:00","dateModified":"2026-09-21T17:54:21+08:00","description":"PVA sponge brush rollers for post-CMP semiconductor wafer cleaning. Air-foaming, scratch-free, one-piece molded core. Cuts CMP water use by 10%. OEM.","image":"https:\/\/www.aoqunbrushes.com\/wp-content\/uploads\/2025\/12\/2.jpg","offers":{"@type":"AggregateOffer","priceCurrency":"CNY","availability":"https:\/\/schema.org\/InStock","lowPrice":128,"highPrice":159,"offerCount":4},"publisher":{"@type":"Organization","name":"Aoqunbrushes","url":"https:\/\/www.aoqunbrushes.com\/"},"inLanguage":"en-US","geo":{"version":1,"last_modified":"2026-09-21T17:54:22+08:00","type":"product","summary":{"short":"PVA sponge brush rollers for post-CMP semiconductor wafer cleaning - air-foaming, scratch-free scrubbing with a one-piece molded core that cuts CMP water usage by 10%.","structured":"Product: post-CMP PVA brush rollers and PVA sponge rollers for semiconductor wafer cleaning.\nSupplier: Guangzhou Aoqun New Material Co., Ltd. (Aoqun Brush) - semiconductor brush supplier with 20 years of materials expertise and university R&D partnerships.\nFunction: after chemical mechanical polishing, the roller delivers cleaning chemicals and deionized water to the wafer surface, rolling and scrubbing for continuous cleaning and drying without scratches.\nFeatures: air-foaming technology with no starch residues; industry-leading detection of minimal metal and liquid particles; reduces CMP water usage by 10% and wastewater-treatment energy; shortens break-in time and dummy wafer usage.\nBuild: one-piece molded PVA foam integrated with the core reduces distortion; 100% interconnected pore structure gives excellent liquid transmissibility and self-cleaning.\nService: adjustable water flow; sizes to tool specification."},"faqs":[{"question":"Why use PVA for wafer cleaning?","answer":"PVA sponge stays flexible even when saturated, delivering chemicals and DI water while scrubbing gently - removing CMP slurry and residues without scratching the wafer."},{"question":"How does it reduce water usage?","answer":"Its efficient liquid delivery and self-cleaning pore structure cuts CMP process water use by about 10% and lowers wastewater-treatment energy."},{"question":"Can roller size match our tool?","answer":"Yes. Roller dimensions and core fittings are produced to your cleaning tool's specification."}],"key_points":["Scratch-free post-CMP wafer scrubbing","Air-foaming with no starch residues","Cuts CMP water usage by 10%","One-piece molded core resists distortion","100% interconnected pores self-clean"],"target_audience":"Semiconductor fabs and equipment OEMs, wafer consumable buyers and cleanroom process engineers.","product_data":{"inquiry":false,"price":"128","price_html":"","currency":"CNY","availability":"InStock","categories":["Cylinder Tufted Brush","PCB & Semiconductor"],"attributes":[],"main_image":"https:\/\/www.aoqunbrushes.com\/wp-content\/uploads\/2025\/12\/2.jpg","gallery":["https:\/\/www.aoqunbrushes.com\/wp-content\/uploads\/2025\/12\/1.jpg","https:\/\/www.aoqunbrushes.com\/wp-content\/uploads\/2025\/12\/3.jpg","https:\/\/www.aoqunbrushes.com\/wp-content\/uploads\/2025\/12\/4.jpg","https:\/\/www.aoqunbrushes.com\/wp-content\/uploads\/2025\/12\/5.jpg"]},"source":{"generated_by":"manual"}}}